Comprehensive Overview of ASML's High-NA EUV Machine Sales

A Detailed Breakdown by Year and Key Customers

Key Takeaways

2023 marked the debut year for ASML's High-NA EUV machines, with Intel as the inaugural customer.
In 2024, ASML significantly ramped up production, primarily serving Intel and expanding to TSMC.
ASML's High-NA EUV technology is pivotal for advancing semiconductor manufacturing, with substantial orders anticipating future growth.

Introduction to High-NA EUV Technology

ASML's High Numerical Aperture Extreme Ultraviolet (High-NA EUV) lithography machines represent a groundbreaking advancement in semiconductor manufacturing. These machines are essential for fabricating the most advanced microchips, enabling smaller, faster, and more energy-efficient processors that power modern electronics. High-NA EUV technology allows for finer patterning with enhanced resolution, addressing the ever-increasing demand for high-performance and high-density semiconductor devices.

Yearly Sales Overview

Detailed Sales by Year

Year	Number of Machines Sold	Customers
2023	1	Intel
2024	6	Intel (5), TSMC (1)
2025 (up to Jan)	0	—

Annual Sales Breakdown

2023: The Inaugural Year

In 2023, ASML shipped its first High-NA EUV machine, model EXE:5000, to Intel. This milestone marked the commencement of ASML's High-NA EUV series, setting the stage for subsequent sales and deployments. The delivery in December 2023 enabled Intel to commence testing and integration of the advanced lithography system into their semiconductor manufacturing processes.

2024: Expansion and Increased Production

The year 2024 saw a significant increase in ASML's High-NA EUV machine sales. ASML's production capacity allowed for the sale of approximately five to six machines. Intel secured the entire stock for 2024, acquiring five High-NA EUV machines to bolster their semiconductor fabrication capabilities. Additionally, ASML expanded its customer base by shipping one High-NA EUV machine to TSMC, marking TSMC as the second known customer for ASML's High-NA EUV technology.

2025: Early Year Projections

As of January 26, 2025, there have been no additional sales of High-NA EUV machines. However, with a strong pipeline of orders ranging between 10 to 20 machines, ASML is poised for continued growth and increased deliveries in the latter half of 2025 and beyond. The anticipation around the deployment of these machines underscores the critical role ASML plays in the advancement of semiconductor manufacturing.

Key Customers and Their Impact

Intel: The Pioneering Partner

Intel stands as the primary customer for ASML's High-NA EUV machines. By securing all five machines produced in 2024, Intel has demonstrated its commitment to adopting cutting-edge lithography technology to maintain its competitive edge in semiconductor manufacturing. The integration of High-NA EUV machines allows Intel to pursue more advanced process nodes, such as the 1.4nm (A14) process, slated for mass production in 2027.

TSMC: Expanding the Customer Base

In late 2024, ASML commenced the delivery of a High-NA EUV machine to Taiwan Semiconductor Manufacturing Company (TSMC). As a leading pure-play foundry, TSMC's adoption of High-NA EUV technology is pivotal for enabling their clients to develop the most advanced semiconductor devices. This partnership not only diversifies ASML's customer portfolio but also reinforces the significance of High-NA EUV in the global semiconductor supply chain.

Future Prospects and Potential Customers

While Intel and TSMC currently lead in acquiring High-NA EUV machines, other major semiconductor manufacturers such as Samsung are speculated to procure these advanced systems in the near future. The high demand and limited production capacity suggest that ASML may prioritize existing customers while exploring avenues to expand its clientele further.

Market Implications and Technological Advancements

Advancing Semiconductor Manufacturing

The adoption of ASML's High-NA EUV machines is a testament to the semiconductor industry's relentless pursuit of miniaturization and performance enhancement. High-NA EUV enables the creation of smaller feature sizes on silicon wafers, which translates to more transistors per chip, resulting in faster and more efficient processors. This technological leap is essential for meeting the escalating demands of applications ranging from artificial intelligence and machine learning to high-performance computing and mobile devices.

Economic Impact

ASML's High-NA EUV machines, priced at approximately €350 million each, represent a significant investment for semiconductor manufacturers. These investments drive economic growth within the semiconductor supply chain, fostering advancements in related industries such as materials science, optics, and precision engineering. Moreover, the deployment of High-NA EUV machines positions manufacturers to produce more competitive and innovative products, thereby enhancing their market standing globally.

Technological Challenges and Solutions

Implementing High-NA EUV technology presents several challenges, including maintaining the precision of lithography processes and managing the enormous data throughput required for advanced chip designs. ASML has addressed these challenges through relentless research and development, ensuring that their High-NA EUV systems deliver unparalleled performance and reliability. The collaboration with key industry players like Intel and TSMC further facilitates the refinement of these systems, tailoring them to meet specific manufacturing needs.

Future Outlook and Projections

Projected Sales and Production

Looking ahead, ASML anticipates a surge in demand for High-NA EUV machines as semiconductor manufacturers strive to adopt more advanced process nodes. With current orders ranging between 10 to 20 additional machines, ASML is expected to significantly scale its production capabilities in the coming years. This expansion is vital for sustaining the growth trajectory of the High-NA EUV segment and meeting the burgeoning needs of the semiconductor industry.

Technological Innovations

ASML continues to innovate within the High-NA EUV space, focusing on enhancing the numerical aperture and optimizing the optical systems to further improve resolution and throughput. These advancements will enable manufacturers to push the boundaries of chip design, facilitating breakthroughs in performance and energy efficiency. Additionally, ASML is exploring synergies with other emerging technologies, such as artificial intelligence and machine learning, to optimize lithography processes and predictive maintenance.

Global Semiconductor Supply Chain

The integration of High-NA EUV machines into the global semiconductor supply chain underscores the interdependence of technology and manufacturing. ASML's role as a key supplier of advanced lithography systems ensures that leading semiconductor manufacturers remain at the forefront of innovation. This symbiotic relationship fosters a robust ecosystem where technological advancements and manufacturing capabilities evolve in tandem, driving progress across various sectors reliant on semiconductor technology.

Conclusion

ASML's High-NA EUV machines are revolutionizing the semiconductor manufacturing landscape, enabling the production of the most advanced microchips. With Intel and TSMC as primary customers, ASML has demonstrated the critical importance of High-NA EUV technology in advancing semiconductor fabrication. As demand continues to rise and ASML scales its production, the High-NA EUV segment is poised for significant growth, driving innovation and economic impact across the global technology sector.